Minimum consumption wafer coating

2002 Proceedings - 8th International Advanced Packaging Materials Symposium

Volumn , Issue , 2002, Pages 302-310

  Curtis, Anthony ^a   Bisson, Peter ^b   Hamel, Clifford ^b   Hughlett, Emmett ^b  

^a Kulicke and Soffa   (United States)

^b SUSS MicroTec Lithography GmbH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS;

COATING MATERIAL; CYCLE TIME; PHOTO-DEFINABLE; POLYMER MATERIALS;

PACKAGING MATERIALS;

EID: 84949951771     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISAPM.2002.990403     Document Type: Conference Paper

References (4)

1. W.M. Moreau, Semiconductor Lithography, Chapter 6-5, Page 291-307, 1988 Plenum Press, New York, NY.
2. College Physics (1985), Serway & Faughn-Sanders Publishing, pages 171-185.
3. C.J. Hamel, "Improved Method of Spin Coating Characterization", Suss Report, Vol 14, Forth Quarter'98, Page 10.
4. P. Van Zant, Microchip Fabrication, Page 217-222, (2000) McGraw-Hill.