Using single source precursors and spray chemical vapor deposition to grow thin-film CuInS2

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 563-566

  Harris, Jerry D ^a   Hehemann, David G ^a   Cowen, Jonathan E ^a   Hepp, Aloysius F ^b   Raffaelle, Ryne P ^c   Hollingsworth, Jennifer A ^d  

^a KENT STATE UNIVERSITY   (United States)

^b NASA GLENN RESEARCH CENTER   (United States)

^c ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^d LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; FLOW OF GASES; FUSED SILICA; ORGANOMETALLICS; STAINLESS STEEL; THIN FILMS;

CARRIER GAS FLOW RATES; ORGANOMETALLIC PRECURSORS; POLYBENZOBISOXAZOLE; SINGLE SOURCE; SINGLE-SOURCE PRECURSOR; SUBSTRATE TEMPERATURE;

VAPOR DEPOSITION;

EID: 84949557952     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915900     Document Type: Conference Paper

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