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Volumn , Issue , 2000, Pages 138-141

Material properties of polysilicon layers deposited by atmospheric pressure iodine vapor transport

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; HALL MOBILITY; HOLE MOBILITY; IODINE; OPEN CIRCUIT VOLTAGE; PASSIVATION; POLYCRYSTALLINE MATERIALS; POLYSILICON; STACKING FAULTS;

EID: 84949552266     PISSN: 01608371     EISSN: None     Source Type: Journal    
DOI: 10.1109/PVSC.2000.915773     Document Type: Article
Times cited : (7)

References (4)
  • 1
    • 0000039848 scopus 로고    scopus 로고
    • Crystalline Si films on foreign substrates for electronic applications
    • R.B. Bergmann, "Crystalline Si Films on Foreign Substrates for Electronic Applications," Recent Res. Devel. Crystal Growth Res., 1 (1999):241-256.
    • (1999) Recent Res. Devel. Crystal Growth Res. , vol.1 , pp. 241-256
    • Bergmann, R.B.1
  • 2
    • 0033728808 scopus 로고    scopus 로고
    • Growth of large-grain silicon layers by atmospheric iodine vapor transport
    • T.H. Wang and T.F. Ciszek, "Growth of Large-Grain Silicon Layers by Atmospheric Iodine Vapor Transport," J. The Electrochemical Society, 147(5) 1945-1949 (2000).
    • (2000) J. The Electrochemical Society , vol.147 , Issue.5 , pp. 1945-1949
    • Wang, T.H.1    Ciszek, T.F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.