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Volumn , Issue , 2000, Pages 138-141
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Material properties of polysilicon layers deposited by atmospheric pressure iodine vapor transport
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Author keywords
[No Author keywords available]
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Indexed keywords
ATMOSPHERIC PRESSURE;
HALL MOBILITY;
HOLE MOBILITY;
IODINE;
OPEN CIRCUIT VOLTAGE;
PASSIVATION;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
STACKING FAULTS;
CRYSTALLOGRAPHIC DEFECTS;
DEPOSITED MATERIALS;
DIRECT DEPOSITION;
FOREIGN SUBSTRATES;
HYDROGEN PASSIVATION;
INTERMEDIATE TEMPERATURES;
POLYCRYSTALLINE SILICON LAYERS;
POLYSILICON LAYERS;
ATMOSPHERIC MOVEMENTS;
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EID: 84949552266
PISSN: 01608371
EISSN: None
Source Type: Journal
DOI: 10.1109/PVSC.2000.915773 Document Type: Article |
Times cited : (7)
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References (4)
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