Study of SI deposition in a batch-type LPCVD-system for industrial thin-film crystalline Si solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 347-350

  Poortmans, J ^a   Beaucarne, G ^a   Sivoththaman, S ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF WATERLOO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; LEAKAGE CURRENTS; QUARTZ; SILICON; SILICON WAFERS; SOLAR CELLS; THERMAL INSULATION; THIN FILMS; VAPOR DEPOSITION;

CERAMIC SUBSTRATES; CRYSTALLINE SI SOLAR CELLS; DEPOSITION PROCESS; HOMOGENEOUS LAYERS; INDUSTRIAL PRODUCTION; LOW PRESSURE CHEMICAL VAPOUR DEPOSITIONS; LOW-LEAKAGE CURRENT; THIN-FILM SI SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 84949546582     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915835     Document Type: Conference Paper

References (9)

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