Application of electron-beam illuminated low-k silicate to nanoscale interconnect technology

Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003

Volumn , Issue , 2003, Pages 110-

  Liu, Po Tsun ^a   Chang, T C ^b   Lin, Z W ^c   Tsai, T M ^c   Chen, C W ^c   Chen, B C ^a   Lee, J K ^d   Chen, Grace ^d   Tsai, Eric ^d   Chang, Joe ^d  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^d Dow Corning Taiwan Inc   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; SILICATES;

DIRECT-PATTERNING; HYDROGEN SILSESQUIOXANE; INTERCONNECT TECHNOLOGY; NANO SCALE;

NANOTECHNOLOGY;

EID: 84949193627     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2003.1268600     Document Type: Conference Paper

References (0)