Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 1, 2016, Pages

  Yang, Mengdi ^a   Aarnink, Antonius A I ^a   Kovalgin, Alexey Y ^a   Gravesteijn, Dirk J ^a   Wolters, Rob A M ^a   Schmitz, Jurriaan ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITS; GROWTH KINETICS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC HYDROGEN; CHEMICAL VAPOR DEPOSITIONS (CVD); GROWTH BEHAVIOR; MOLECULAR HYDROGEN; SPECTROSCOPIC ELLIPSOMETERS; TUNGSTEN (W); TUNGSTEN FILAMENTS; TUNGSTEN FILMS;

TUNGSTEN;

EID: 84948652164     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4936387     Document Type: Article

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