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Volumn 6, Issue 47, 2015, Pages 8176-8183

Wafer-scale synthesis of defined polymer brushes under ambient conditions

(8) Zhang, Tao a Du, Yunhao a Kalbacova, Jana b Schubel, René a Rodriguez, Raul D b Chen, Tao c Zahn, Dietrich R T b Jordan, Rainer a

a DRESDEN UNIVERSITY OF TECHNOLOGY (Germany)

b CHEMNITZ UNIVERSITY OF TECHNOLOGY (Germany)

c NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING (China)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; COPPER; COPPER PLATING; LITHOGRAPHY; MONOMERS; POLYMERIZATION; SUBSTRATES;

CONTROLLED RADICAL POLYMERIZATION; END-GROUP FIDELITIES; GRAFTING DENSITIES; HIGH MOLAR MASS POLYMERS; PROXIMITY PRINTING; REACTION SOLUTIONS; SURFACE INITIATED POLYMERIZATION; TETRABLOCK COPOLYMERS;

DENDRIMERS;

EID: 84948415402 PISSN: 17599954 EISSN: 17599962 Source Type: Journal
DOI: 10.1039/c5py01274k Document Type: Article

Times cited : (73)

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