Growth of Silicon Nanosheets Under Diffusion-Limited Aggregation Environments

Nanoscale Research Letters

Volumn 10, Issue 1, 2015, Pages

  Lee, Jaejun ^a   Kim, Sung Wook ^a   Kim, Ilsoo ^a   Seo, Dongjea ^a   Choi, Heon Jin ^a  

^a Yonsei University   (South Korea)

Author keywords

CVD; Diffusion limited aggregation; Epitaxial growth; Silicon nanosheets

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; EPITAXIAL GROWTH; NANOSHEETS; SILICON; SUBSTRATES;

2D GROWTH; ATMOSPHERIC CHEMICAL VAPOR DEPOSITIONS; DENDRITIC GROWTH; DIFFUSION LIMITED AGGREGATION; KINETIC ASPECTS; SI SUBSTRATES; SINGLE-CRYSTALLINE; TWO DIMENSIONAL (2 D);

AGGLOMERATION;

EID: 84945536304     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/s11671-015-1138-2     Document Type: Article

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