Parameters affecting alignment dispersion on an optical wafer stepper

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1138, Issue , 1989, Pages 64-71

  Charles, Alain ^a  

^a ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT; ALUMINUM; BUDGET CONTROL; PHOTORESISTS; SURFACE ROUGHNESS;

ALIGNMENT MARKS; CENTRIFUGAL FORCES; GRAIN SIZE; GRID LAYOUT; OPTICAL WAFER; RESIST PROCESS; RESIST SYSTEMS; TWO PARAMETER;

DISPERSIONS;

EID: 84943677853     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.961745     Document Type: Conference Paper

References (24)

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