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Volumn 95, Issue , 2015, Pages 664-671

Low damage pre-doping on CVD graphene/Cu using a chlorine inductively coupled plasma

Author keywords

Cl radical; Combined doping; ICP system; Mesh grid; Normal doping; Pre doping; Resistance; Transmittance

Indexed keywords

CHLORINE; ELECTRIC RESISTANCE; INDUCTIVELY COUPLED PLASMA; SHEET RESISTANCE; SURFACE DEFECTS;

EID: 84943532339     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2015.08.070     Document Type: Article
Times cited : (44)

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