Preparation and properties of SiO2 thin films by the sol-gel method using photoirradiation and its application to surface coating for display

Chemical Processing of Ceramics, Second Edition

Volumn , Issue , 2005, Pages 421-436

  Ohishi, Tomoji ^a  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84942241892     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

References (17)

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