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Volumn 7, Issue 35, 2015, Pages 19857-19862

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

Author keywords

ALD; atomic layer deposition; plasma; plasma assisted ALD; Si3N4; silicon nitride; thin film; wet etch

Indexed keywords

ATOMS; NITRIDES; PLASMAS; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; THIN FILMS; WET ETCHING;

EID: 84941126469     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b06833     Document Type: Article
Times cited : (92)

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