Reaction of CO with Preadsorbed Oxygen on Low-Index Copper Surfaces: An Ambient Pressure X-ray Photoelectron Spectroscopy and Scanning Tunneling Microscopy Study

Journal of Physical Chemistry C

Volumn 119, Issue 26, 2015, Pages 14669-14674

  Eren, Baran ^a   Lichtenstein, Leonid ^a   Wu, Cheng Hao ^a,b   Bluhm, Hendrik ^a   Somorjai, Gabor A ^a,b   Salmeron, Miquel ^a,c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c University of California Berkeley   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BINDING ENERGY; CHEMISORPTION; COPPER; OXYGEN; PHOTOELECTRONS; PHOTONS; REACTION RATES; SCANNING TUNNELING MICROSCOPY;

AMBIENT-PRESSURE X-RAY PHOTOELECTRON SPECTROSCOPIES; APPARENT ACTIVATION ENERGY; CHEMISORBED OXYGEN; FUNCTION OF TIME; HIGH-PRESSURE SCANNING TUNNELING MICROSCOPIES; ORDERS OF MAGNITUDE; TEMPERATURE RANGE; TORR PRESSURE RANGES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84940975964     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp512831f     Document Type: Article

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