Templating Sol-Gel Hematite Films with Sacrificial Copper Oxide: Enhancing Photoanode Performance with Nanostructure and Oxygen Vacancies

ACS Applied Materials and Interfaces

Volumn 7, Issue 31, 2015, Pages 16999-17007

  Li, Yang ^a,b   Guijarro, Néstor ^b   Zhang, Xiaoli ^a   Prévot, Mathieu S ^b   Jeanbourquin, Xavier A ^b   Sivula, Kevin ^b   Chen, Hong ^a   Li, Yongdan ^a  

^a TIANJIN UNIVERSITY   (China)

^b EPFL   (Switzerland)

Author keywords

copper oxide; hematite; photoelectrochemistry; sol gel; water splitting

Indexed keywords

ANNEALING; COPPER; COPPER OXIDES; ELECTROCHEMISTRY; HEMATITE; OXIDE FILMS; OXYGEN VACANCIES; SOL-GEL PROCESS; SOL-GELS;

FARADAIC EFFICIENCIES; INCIDENT PHOTON-TO-CURRENT EFFICIENCIES; MOTT-SCHOTTKY ANALYSIS; PHOTO-ELECTROCHEMISTRY; PHOTOELECTROCHEMICAL PERFORMANCE; PHOTOELECTROCHEMICALS; SACRIFICIAL TEMPLATING; WATER SPLITTING;

NANOSTRUCTURES;

EID: 84939165459     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b02111     Document Type: Article

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