Wafer mapping of total dose failure thresholds in a bipolar recessed field oxide technology

IEEE Transactions on Nuclear Science

Volumn 34, Issue 6, 1987, Pages 1751-1756

  Titus, Jeffrey L ^a   Platteter, Dale G ^a  

^a NAVAL SURFACE WARFARE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84939058488     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/TNS.1987.4337549     Document Type: Article

References (3)

1. Pease, Turfler, Platteter, Emily, and Blice, “Total Dose Effects in Recessed Field Oxide Digital Bipolar Microcircuits”, IEEE Transactions on Nuclear Science, December 1983.
2. Mattis, R. L., Semiconductor Measurement Technology: A FORTRAN Program for Analysis of Data from Microelectronic Test Structures, NBS Special Publication 400–75 (July 1983).
3. Oldham, and McGarrity, “Comparison of Cobalt 60 Response and 10 KeV X-Ray Response in MOS Capacitors”, IEEE Transactions on Nuclear Science, December 1983.