Chemical bonding features of fluorine and boron in bf2 -ion-implanted si

Japanese Journal of Applied Physics

Volumn 29, Issue 12, 1990, Pages 2349-2352

  Kinoshita, Tsuyoshi ^a   Takakura, Masaru ^a   Miyazaki, Seiichi ^a   Yokoyama, Shin ^a   Koyanagi, Mitsumasa ^a   Hirose, Masataka ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Bf; Chemical bonding state; Implantation; Infrared absorption; Raman scattering; X ray photo electron spectroscopy

Indexed keywords

EID: 84938022554     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.29.L2349     Document Type: Article

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