The polymeric nanofilm of triazinedithiolsilane fabricated by self-assembled technique on copper surface. Part 1: Design route and corrosion resistance

Corrosion Science

Volumn 98, Issue , 2015, Pages 382-390

  Wang, Yabin ^a,b   Liu, Zhong ^a   Li, Deyu ^b   Dong, Yaping ^a   Li, Wu ^a   Li, Ning ^b  

^a QINGHAI INSTITUTE OF SALT LAKES   (China)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

A. Copper; B. Cyclic voltammetry; B. EIS; B. Polarization; C. Interfaces

Indexed keywords

CORROSION INHIBITORS; CORROSION PROTECTION; CORROSION RESISTANCE; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL CORROSION; FABRICATION; POLYMERS; SYNTHESIS (CHEMICAL);

B. EIS; COPPER SURFACE; ELECTROCHEMICAL TEST; METAL PROTECTIONS; NANO FILMS; NOVEL DESIGN; PROTECTIVE GROUP;

COPPER CORROSION;

EID: 84937970723     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2015.05.054     Document Type: Article

References (50)

1. Wang P., Liang C., Wu B., Huang N., Li J. Protection of copper corrosion by modification of dodecanethiol self-assembled monolayers prepared in aqueous micellar solution. Electrochim. Acta 2010, 55:878-883.
2. Feng Y., Teo W., Siow K., Gao Z., Tan K., Hsieh A. Corrosion protection of copper by a self-assembled monolayer of alkanethiol. J. Electrochem. Soc. 1997, 144:55-64.
3. Finšgar M., Milošev I. Inhibition of copper corrosion by 1,2,3-benzotriazole: a review. Corros. Sci. 2010, 52:2737-2749.
4. Maho A., Denayer J., Delhalle J., Mekhalif Z. Electro-assisted assembly of aliphatic thiol, dithiol and dithiocarboxylic acid monolayers on copper. Electrochim. Acta 2011, 56:3954-3962.
5. Fan H., Li S., Zhao Z., Wang H., Shi Z., Zhang L. Inhibition of brass corrosion in sodium chloride solutions by self-assembled silane films. Corros. Sci. 2011, 53:4273-4281.
6. Hong S., Chen W., Zhang Y., Luo H., Li M., Li N. Investigation of the inhibition effect of trithiocyanuric acid on corrosion of copper in 3.0wt% NaCl. Corros. Sci. 2013, 66:308-314.
7. Finšgar M., Merl D. 2-Mercaptobenzoxazole as a copper corrosion inhibitor in chloride solution: electrochemistry, 3D-profilometry, and XPS surface analysis. Corros. Sci. 2014, 80:82-95.
8. Appa Rao B., Iqbal M., Sreedhar B. Electrochemical surface analytical studies of the self-assembled monolayer of 5-methoxy-2-(octadecylthio)benzimidazole in corrosion protection of copper. Electrochim. Acta 2010, 55:620-631.
9. Li C., Li L., Wang C. Study of the inhibitive effect of mixed self-assembled monolayers on copper with SECM. Electrochim. Acta 2014, 115:531-536.
10. Wang F., Liu J., Li Y., Wang Y. Novel composite nanofilm of electropolymerization and self-assembling on AA5052 surface as corrosion coating. J. Appl. Polym. Sci. 2012, 123:2906-2910.
11. Mazumder M., Al-Muallem H., Faiz M., Ali S. Design and synthesis of a novel class of inhibitors for mild steel corrosion in acidic and carbon dioxide-saturated saline media. Corros. Sci. 2014, 87:187-198.
12. Daoud D., Douadi T., Issaadi S., Chafaa S. Adsorption and corrosion inhibition of new synthesized thiophene Schiff base on mild steel X52 in HCl and H 2 SO 4 solutions. Corros. Sci. 2014, 79:50-58.
13. Hegazy M., Abdallah M., Awad M., Rezk M. Three novel di-quaternary ammonium salts as corrosion inhibitors for API X65 steel pipeline in acidic solution. Part I: experimental results. Corros. Sci. 2014, 81:54-64.
14. Mori K., Asabe N., Nakamura Y. Study of triazine thiols. III. Preparation of triazine thiol-containing polymers. J. Polym. Sci. 1982, 20:321-327.
15. Mori K., Oishi Y., Miyashita T., Matsuda M. Polymerization of monomer films of triazine dithiols on a copper surface. Polym. Int. 1992, 28:193-199.
16. Zhu D., Van Ooij W. Enhanced corrosion resistance of AA 2024-T3 and hot-dip galvanized steel using a mixture of bis-[triethoxysilylpropyl]tetrasulfide and bis-[trimethoxysilylpropyl]amine. Electrochim. Acta 2004, 49:1113-1125.
17. Wang F., Li Y., Wang Y., Cao Z. Self-assembled monolayer of designed and synthesized triazinedithiolsilane molecule as interfacial adhesion enhancer for integrated circuit. Nanoscale Res. Lett. 2011, 6:483-488.
18. Socha R., Laajalehto K., Nowak P. Oxidation of the silicon carbide surface in Watts' plating bath. Surf. Interface Anal. 2002, 34:413-417.
19. Perruchot C., Chehimi M.M., Delamar M., Cabet-Deliry E., Miksa B., Slomkowski S., Khan M.A., Armes S.P. Chemical deposition and characterization of thin polypyrrole films on glass plates: role of organosilane treatment. Colloid Polym. Sci. 2000, 278:1139-1154.
20. Laibinis P., Whitesides G. Self-assembled monolayers of n-alkanethiolates on copper are barrier films that protect the metal against oxidation by air. J. Am. Chem. Soc. 1992, 114. 9022-9022.
21. Zhu D., Van Ooij W. Structural characterization of bis-[triethoxysilylpropyl tetrasulfide] and bis-[trimethoxysilylpropyl]amine silanes by Fourier-transform infrared spectroscopy and electrochemical impedance spectroscopy. J. Adhes. Sci. Technol. 2002, 16:1235-1260.
22. Shi X., Graiver D., Narayan R. Hydrolysis and condensation of hydrophilic alkoxysilanes under acidic conditions. Silicon 2012, 4:109-119.
23. Venditti F., Angelico R., Palazzo G., Colafemmina G., Ceglie A., Lopez F. Preparation of nanosize silica in reverse micelles: ethanol produced during TEOS hydrolysis affects the microemulsion structure. Langmuir 2007, 23:10063-10068.
24. Yang L., Feng J., Zhang W., Qu J. Experimental and computational study on hydrolysis and condensation kinetics of (-glycidoxypropyltrimethoxysilane ((-GPS). Appl. Surf. Sci. 2010, 257:990-996.
25. McNeil K., DiCaprio J., Walsh D., Pratt R. Kinetics and mechanism of hydrolysis of a silicate triester, tris (2-methoxyethoxy) phenylsilane. J. Am. Chem. Soc. 1980, 102:1859-1865.
26. Kear G., Barker B., Walsh F. Electrochemical corrosion of unalloyed copper in chloride media--a critical review. Corros. Sci. 2004, 46:109-135.
27. Benedeti A., Sumodjo P., Nobe K., Cabot P., Proud W. Electrochemical studies of copper, copper-aluminium and copper-aluminium-silver alloys: impedance results in 0.5M NaCl. Electrochim. Acta 1995, 40:2657-2668.
28. Mori K., Watanabe A., Muroi A., Nakamura Y. Study on functionalization of metal surfaces. III. Photopolymerization of monomer films on metal surfaces. J. Polym. Sci. Pol. Chem. 1987, 25:2893-2907.
29. Zhu D., van Ooij W.J. Corrosion protection of AA 2024-T3 by bis-[3-(triethoxysilyl) propyl] tetrasulfide in sodium chloride solution: part 2: mechanism for corrosion protection. Corros. Sci. 2003, 45:2177-2197.
30. Bakkar A., Ataya S. Corrosion behaviour of stainless steel fibre-reinforced copper metal matrix composite with reference to electrochemical response of its constituents. Corros. Sci. 2014, 85:343-351.
31. Wang C., Chen S., Ma H., Qi C. Protection of copper corrosion by carbazole and N-vinylcarbazole self-assembled films in NaCl solution. J. Appl. Electrochem. 2003, 33:179-186.
32. Feng Y., Teo W., Siow K., Tan K. The corrosion behaviour of copper in neutral tap water. Part I: corrosion mechanisms. Corros. Sci. 1996, 38:369-385.
33. Wu X., Ma H., Chen S., Xu Z., Sui A. General equivalent circuits for faradaic electrode processes under electrochemical reaction control. J. Electrochem. Soc. 1999, 146:1847-1853.
34. Li S., Wang Y., Chen S., Yu R., Lei S., Ma H., Liu D. Some aspects of quantum chemical calculations for the study of Schiff base corrosion inhibitors on copper in NaCl solutions. Corros. Sci. 1999, 41:1769-1782.
35. Chen Z., Huang L., Zhang G., Qiu Y., Guo X. Benzotriazole as a volatile corrosion inhibitor during the early stage of copper corrosion under adsorbed thin electrolyte layers. Corros. Sci. 2012, 65:214-222.
36. Zhang D., Cai Q., He X., Gao L., Kim G. The corrosion inhibition of copper in hydrochloric acid solutions by a tripeptide compound. Corros. Sci. 2009, 51:2349-2354.
37. Levillain E., Demortier A., Lelieur J. Electrochemical impedance of solutions of polysulfides in liquid ammonia: experimental evidence for the gerischer impedance. J. Electroanal. Chem. 1995, 394:103-115.
38. Tesoro G., Wu Y. Silane coupling agents: the role of the organofunctional group. J. Adhes. Sci. Technol. 1991, 5:771-784.
39. Premachandra J., Van Ooij W., Mark J. Reaction kinetics of gamma-ureidopropyltrimethoxysilane in the water-methanol system studied by FTIR spectroscopy. J. Adhes. Sci. Technol. 1998, 12:1361-1376.
40. Van Ooij W., Child T. Protecting metals with silane coupling agents. Chemtechnology 1998, 28:26-35.
41. Destreri M., Vogelsang J., Fedrizzi L., Deflorian F. Water up-take evaluation of new waterborne and high solid epoxy coatings. Part II: electrochemical impedance spectroscopy. Prog. Org. Coat. 1999, 37:69-81.
42. McCafferty E., Hackerman N. Double layer capacitance of iron and corrosion inhibition with polymethylene diamines. J. Electrochem. Soc. 1972, 119:146-154.
43. Castner D., Hinds K., Grainger D. X-ray photoelectron spectroscopy sulfur 2p study of organic thiol and disulfide binding interactions with gold surfaces. Langmuir 1996, 12:5083-5086.
44. Ishida T., Choi N., Mizutani W., Tokumoto H., Kojima I., Azehara H., Hokari H., Akiba U., Fujihira M. High-resolution X-ray photoelectron spectra of organosulfur monolayers on Au (111): S (2p) spectral dependence on molecular species. Langmuir 1999, 15:6799-6806.
45. Heister K., Allara D., Bahnck K., Frey S., Zharnikov M., Grunze M. Deviations from 1: 1 compositions in self-assembled monolayers formed from adsorption of asymmetric dialkyl disulfides on gold. Langmuir 1999, 15:5440-5443.
46. Mori K., Okai Y., Horie H., Yamada H. The corrosion and inhibition of copper powders. Corros. Sci. 1991, 32:1237-1252.
47. Dargère N., Bounor-Legaré V., Boisson F., Cassagnau P., Martin G., Sonntag P., Garois N. Hydridosilazanes hydrolysis-condensation reactions studied by 1H and 29Si liquid NMR spectroscopy. J. Sol-Gel Sci. Technol. 2012, 62:389-396.
48. Wang D., Xiang B., Liang Y., Song S., Liu C. Corrosion control of copper in 3.5% NaCl solution by domperidone: experimental and theoretical study. Corros. Sci. 2014, 85:77-86.
49. Li C., Li L., Wang C., Zhu Y., Zhang W. Study of the protection performance of self-assembled monolayers on copper with the scanning electrochemical microscope. Corros. Sci. 2014, 80:511-516.
50. Ling Y., Guan Y., Han K. Corrosion inhibition of copper with benzotriazole and other organic surfactants. Corrosion 1995, 51:367-375.