Photochemically Engineering the Metal-Semiconductor Interface for Roomerature Transfer Hydrogenation of Nitroarenes with Formic Acid

Chemistry - A European Journal

Volumn 20, Issue 50, 2014, Pages 16732-16737

  Li, Xin Hao ^a   Cai, Yi Yu ^a   Gong, Ling Hong ^a   Fu, Wei ^a   Wang, Kai Xue ^a   Bao, Hong Liang ^b   Wei, Xiao ^a   Chen, Jie Sheng ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF APPLIED PHYSICS   (China)

Author keywords

formic acid; heterogeneous catalysis; hydrogenation; interfaces; sustainable chemistry

Indexed keywords

ADDITIVES; ANILINE; CARBON NITRIDE; CATALYSIS; HYDROGEN; HYDROGENATION; INTERFACES (MATERIALS); NITROBENZENE;

CATALYTIC PROCESS; HIGH-PRESSURE GAS; METAL SEMICONDUCTOR INTERFACE; METAL SEMICONDUCTORS; SACRIFICIAL ADDITIVES; SUSTAINABLE CHEMISTRY; TRANSFER HYDROGENATIONS; WATER AS SOLVENT;

FORMIC ACID;

EID: 84934997024     PISSN: 09476539     EISSN: 15213765     Source Type: Journal    
DOI: 10.1002/chem.201404325     Document Type: Article

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