Numerical reactive diffusion modeling of stacked elemental layer rapid thermal annealed chalcopyrite absorber layer formation

Thin Solid Films

Volumn 582, Issue , 2015, Pages 397-400

  Zweschke, André ^a   Wellmann, Peter J ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Chalcopyrite; Diffusion modeling; Reactive diffusion

Indexed keywords

DIFFUSION; INDIUM COMPOUNDS; RAPID THERMAL ANNEALING; REACTION KINETICS; SELENIUM; SELENIUM COMPOUNDS;

BINARY COMPOUNDS; CHALCOPYRITE; DIFFUSION MODEL; DIFFUSION PROCESS; KINETIC MODELING; RAPID THERMAL ANNEALING (RTA); REACTIVE DIFFUSION; STACKED ELEMENTAL LAYER;

COPPER COMPOUNDS;

EID: 84926435466     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2014.11.002     Document Type: Conference Paper

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