A General Method for Growing Large Area Mesoporous Silica Thin Films on Flat Substrates with Perpendicular Nanochannels

Journal of the American Chemical Society

Volumn 137, Issue 11, 2015, Pages 3779-3782

  Kao, Kun Che ^a   Lin, Cheng Han ^a   Chen, Tzu Ying ^a   Liu, Yi Hsin ^b   Mou, Chung Yuan ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MICROSCOPY; FILM GROWTH; FILM THICKNESS; MESOPOROUS MATERIALS; OIL SHALE; PARAFFINS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

CONFINED SYNTHESIS; CONTROLLED THICKNESS; DIFFERENT SUBSTRATES; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; HEXAGONAL MESOPHASES; MESOPOROUS SILICA THIN FILMS; THIN FILM FORMATION; TRANSMISSION ELECTRON MICROSCOPY (TEM) CHARACTERIZATIONS;

SUBSTRATES;

ACETIC ACID ETHYL ESTER; AMMONIA; DECANE; NANOCHANNEL; OIL; PETROLEUM ETHER; POLYSTYRENE; SILICA NANOPARTICLE; SILICON DIOXIDE; SURFACTANT; ZEOLITE;

ARTICLE; CHEMICAL PROCEDURES; CO ASSEMBLY PROCESS; CONTACT ANGLE; HYDROPHILICITY; HYDROPHOBICITY; MICELLE; PARTICLE SIZE; POROSITY; SCANNING ELECTRON MICROSCOPY; SOLUBILIZATION; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY; CHEMISTRY; SURFACE PROPERTY;

POROSITY; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 84926165158     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/jacs.5b01180     Document Type: Article

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