Photosensitive damage of lysozyme caused by pazufloxacin and the protective effect of ferulic acid

Science China Chemistry

Volumn 58, Issue 3, 2015, Pages 508-513

  Xu, Yulie ^a,b   Liu, Yancheng ^a   Li, Haixia ^a   Zhang, Peng ^a   Zhao, Jianfeng ^a,b   Wang, Wenfeng ^a  

^a SHANGHAI INSTITUTE OF APPLIED PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

ferulic acid; laser flash photolysis; lysozyme; pazufloxacin; pulse radiolysis; SDS PAGE

Indexed keywords

ELECTROPHORESIS; ENZYMES; FREE RADICAL REACTIONS; LIGHT SENSITIVE MATERIALS; PETROLEUM TAR; PHOTOLYSIS; PHOTOSENSITIVITY; RADIATION CHEMISTRY; RATE CONSTANTS; SODIUM DODECYL SULFATE; SODIUM SULFATE;

BIMOLECULAR REACTION; FERULIC ACIDS; LASER FLASH PHOTOLYSIS; PAZUFLOXACIN; PULSE RADIOLYSIS STUDY; SDS-PAGE; SODIUM DODECYL SULFATE-POLYACRYLAMIDE GEL ELECTROPHORESIS; TRANSIENT ABSORPTION SPECTRA;

RADIOLYSIS;

EID: 84925487089     PISSN: 16747291     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11426-014-5174-z     Document Type: Article

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