Controlled growth of zinc oxide nanorods synthesised by the hydrothermal method

Thin Solid Films

Volumn 578, Issue , 2015, Pages 7-10

  Mbuyisa, P N ^a   Ndwandwe, O M ^a   Cepek, C ^b  

^a UNIVERSITY OF ZULULAND   (South Africa)

^b LABORATORIO TASC   (Italy)

Author keywords

Deposition chamber pressure; Magnetron sputtering; Nanorods; Thin films; Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; NANORODS; OXIDE FILMS; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILMS; ZINC METALLOGRAPHY;

CONTROLLED GROWTH; DEPOSITION CHAMBERS; HYDROTHERMAL METHODS; MEAN DIAMETER; OPERATING PRESSURE; SYNTHESIS CONDITIONS; TEMPLATE FILMS; ZINC OXIDE NANORODS;

ZINC OXIDE;

EID: 84925310720     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2015.02.002     Document Type: Article

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