SCOPUS 정보 검색 플랫폼

Volumn 6, Issue 13, 2015, Pages 2523-2530

Ligand effect and oxygen tolerance studies in photochemically induced copper mediated reversible deactivation radical polymerization of methyl methacrylate in dimethyl sulfoxide

(3) Mosnacek J a Eckstein Andicsova A a Borska K a

a POLYMER INSTITUTE (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM TRANSFER RADICAL POLYMERIZATION; CATALYST DEACTIVATION; CATALYST REGENERATION; CATALYSTS; COPPER; DIMETHYL SULFOXIDE; ESTERS; LIGANDS; OXYGEN; PHOTOPOLYMERIZATION; POLYMERIZATION;

CONTROLLED POLYMERIZATION; EQUIMOLAR AMOUNT; INERT ATMOSPHERES; LIGAND STRUCTURE; OXYGEN TOLERANCES; PHOTOCHEMICAL REDUCTION; POLYMERIZATION MIXTURES; POLYMERIZATION OF METHYL METHACRYLATE;

ACRYLIC MONOMERS;

EID: 84925014362 PISSN: 17599954 EISSN: 17599962 Source Type: Journal
DOI: 10.1039/c4py01807a Document Type: Article

Times cited : (62)

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