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Volumn , Issue , 2000, Pages 591-604

Material Balances of Trace Elements in the Ferrosilicon and Silicon Processes

Author keywords

Chemical Analyses; Ferrosilicon; Material Balance; Microsilica; Silicon; Trace Elements

Indexed keywords

ELECTRIC FURNACES; FERROALLOYS; THERMODYNAMICS; TRACE ELEMENTS;

EID: 84924877844     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (16)

References (11)
  • 1
    • 0004229274 scopus 로고
    • 2.nd edition, Text Book D.C. Heath and Company Lexington Massachusetts
    • S.S.Zumdahl, Chemical Principles, 2.nd edition, Text Book D.C. Heath and Company Lexington Massachusetts, 1995.
    • (1995) Chemical Principles
    • Zumdahl, S.S.1
  • 3
    • 84959107831 scopus 로고    scopus 로고
    • Material balance for trace elements for all Elkem Silicon and FeSi-plants in Norway
    • (in Norwegian), Report to SFT (The Norwegian Pollution Control Authority), 21 February
    • H. Tveit and E. Myrhaug, “Material balance for trace elements for all Elkem Silicon and FeSi-plants in Norway” (in Norwegian), Report to SFT (The Norwegian Pollution Control Authority), 21 February 2000.
    • (2000)
    • Tveit, H.1    Myrhaug, E.2
  • 4
    • 85197748090 scopus 로고    scopus 로고
    • Important sub-processes in the silicon process. The behavior of trace elements
    • Tromsø, Norway, May 29-June 2
    • H. Tveit and E. Myrhaug, “Important sub-processes in the silicon process. The behavior of trace elements.”, Silicon for the chemical industry V, Tromsø, Norway, May 29-June 2, 2000.
    • (2000) Silicon for the chemical industry V
    • Tveit, H.1    Myrhaug, E.2
  • 10
    • 0003392020 scopus 로고    scopus 로고
    • ver. 3.02, with user manual, Outokumpu Research Oy, Finland
    • A. Roine, “Outokumpu HSC Chemistry® for Windows”, ver. 3.02, with user manual, Outokumpu Research Oy, Finland, 1997.
    • (1997) Outokumpu HSC Chemistry® for Windows
    • Roine, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.