Optical and electrical properties of (Ti-V)Ox thin film as n-type transparent oxide semiconductor

Bulletin of the Polish Academy of Sciences: Technical Sciences

Volumn 62, Issue 3, 2014, Pages 583-588

  Mazur, M ^a   Domaradzki, J ^a   Wojcieszak, D ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

(Ti V)Ox thin film; Magnetron sputtering; Optical and electrical properties; Transparent electronics; Transparent oxide semiconductor

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; MAGNETRON SPUTTERING; NANOCRYSTALS; OPTICAL PROPERTIES; OXIDE MINERALS; OXIDE SEMICONDUCTORS; SEMICONDUCTOR DOPING; SILICON COMPOUNDS; SUBSTRATES; TITANIUM DIOXIDE; VANADIUM METALLOGRAPHY; VANADIUM PENTOXIDE;

ELECTRICAL CONDUCTION; ELECTRICAL MEASUREMENT; OPTICAL AND ELECTRICAL PROPERTIES; REACTIVE MAGNETRON SPUTTERING; REFLECTION MEASUREMENTS; TITANIUM DIOXIDE THIN FILM; TRANSPARENT ELECTRONICS; TRANSPARENT OXIDE SEMICONDUCTOR;

THIN FILMS;

EID: 84922790778     PISSN: 02397528     EISSN: 23001917     Source Type: Journal    
DOI: 10.2478/bpasts-2014-0063     Document Type: Article

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