Slurry sampling flow injection chemical vapor generation inductively coupled plasma mass spectrometry for the determination of trace Ge, As, Cd, Sb, Hg and Bi in cosmetic lotions

Analytica Chimica Acta

Volumn 860, Issue , 2015, Pages 8-14

  Chen, Wei Ni ^a   Jiang, Shiuh Jen ^a,b   Chen, Yen Ling ^b   Sahayam, A C ^c  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b KAOHSIUNG MEDICAL UNIVERSITY   (Taiwan)

^c National Centre for Compositional Characterisation of Materials India   (India)

Author keywords

Flow injection; Inductively coupled plasma mass spectrometry; Lotions; Multi elemental analysis; Slurry sampling; Vapor generation

Indexed keywords

AMINO ACIDS; CHEMICAL ANALYSIS; CHLORINE COMPOUNDS; COBALT COMPOUNDS; COSMETICS; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETERS;

FLOW INJECTION; LOTIONS; MULTI-ELEMENTAL ANALYSIS; SLURRY SAMPLING; VAPOR GENERATION;

INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY;

ANTIMONY; ARSENIC; BISMUTH; CADMIUM; COSMETIC; GERMANIUM; MERCURY; THIOUREA;

ARTICLE; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; FLOW INJECTION ANALYSIS; FLOW RATE; LIMIT OF DETECTION; MASS SPECTROMETRY; MEASUREMENT ACCURACY; OXIDATION; SENSITIVITY AND SPECIFICITY; VAPORIZATION; CHEMISTRY; VOLATILIZATION;

ANTIMONY; ARSENIC; BISMUTH; CADMIUM; COSMETICS; FLOW INJECTION ANALYSIS; GERMANIUM; MASS SPECTROMETRY; MERCURY; VOLATILIZATION;

EID: 84922596733     PISSN: 00032670     EISSN: 18734324     Source Type: Journal    
DOI: 10.1016/j.aca.2015.01.011     Document Type: Article

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