Thin film interfacial cross-linking approach to fabricate a chitosan rejecting layer over poly(ether sulfone) support for heavy metal removal

Industrial and Engineering Chemistry Research

Volumn 54, Issue 1, 2015, Pages 472-479

  Zhang, Sui ^a   Hui Peh, Ming ^a   Thong, Zhiwei ^a   Chung, Tai Shung ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHITIN; CHITOSAN; CHLORINE COMPOUNDS; CROSSLINKING; ETHERS; FUME CONTROL; HEAVY METALS; HEXANE; LEAD; LEAD REMOVAL (WATER TREATMENT); PORE SIZE; SALT REMOVAL; WATER TREATMENT;

ABUNDANT RESOURCES; CHITOSAN CONCENTRATION; CROSS LINKED CHITOSAN; CROSSLINKING REACTION; HEAVY METAL REMOVAL; MEMBRANE MORPHOLOGY; POLYETHERSULFONE MEMBRANE; PURE WATER PERMEABILITIES;

CHEMICALS REMOVAL (WATER TREATMENT);

EID: 84921024042     PISSN: 08885885     EISSN: 15205045     Source Type: Journal    
DOI: 10.1021/ie503809c     Document Type: Article

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