Engineering of the polysilicon emtter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster tool

European Solid-State Device Research Conference

Volumn , Issue , 1995, Pages 429-432

  Decoutere, S ^a   Cuthbertson, A ^b   Wilhelm, R ^c   Vandervorst, W ^a   Deferm, L ^a  

^a IMEC   (Belgium)

^b LUCENT TECHNOLOGIES   (United States)

^c ASM International NV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CLUSTER TOOL; INTERFACIAL LAYER; LOW TEMPERATURES; RE-OXIDATION;

EID: 84920720612     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)