Advanced Ti Salicide Process for Sub-0.2 μm CMOS

European Solid-State Device Research Conference

Volumn , Issue , 1996, Pages 93-96

  Rostoll, M L ^a   Maury, D ^a   Regolini, J L ^a   Haond, M ^a   Delpech, P ^b   Gayet, P ^b   Lecontellec, M ^b  

^a ORANGE LABS   (France)

^b STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

SALICIDES;

EID: 84920712613     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. J.B.Lasky et al., IEEE Trans.Eleciron.Dev., vol.38, pp.262-264, 1991.
2. D.Maury et al., Fall Meeline, MRS Symp. Proa, vol 402, 1996.
3. N.S.Parekh el al., IEEE Trans.Electron.Dev., vol.38, pp.88-94, 1991.
4. T. Ohguro et al, IEEE Trans.Eleciron.Dev., vol.41, pp.2305-2317, 1994.