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Volumn , Issue , 2010, Pages

IPR and the Catch-Up Process in Japan

Author keywords

Catch up; Intellectual property; Japan; Licensing; Patent; Reverse engineering; Semiconductor; Technology importation

Indexed keywords


EID: 84920118925     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1093/acprof:oso/9780199574759.003.0004     Document Type: Chapter
Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.