The Effect of Dielectric Constants on Noble Metal/Semiconductor SERS Enhancement: FDTD Simulation and Experiment Validation of Ag/Ge and Ag/Si Substrates

Scientific Reports

Volumn 4, Issue , 2014, Pages

  Wang, Tao ^a,b   Zhang, Zhaoshun ^a   Liao, Fan ^a   Cai, Qian ^a   Li, Yanqing ^a   Lee, Shuit Tong ^a   Shao, Mingwang ^a  

^a SOOCHOW UNIVERSITY   (China)

^b ANQING NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84919650471     PISSN: None     EISSN: 20452322     Source Type: Journal    
DOI: 10.1038/srep04052     Document Type: Article

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