Cobalt sulfide thin films: Chemical growth, reaction kinetics and microstructural analysis

Journal of Alloys and Compounds

Volumn 623, Issue , 2015, Pages 466-472

  Kamble, S S ^a   Sikora, Andrzej ^b   Pawar, S T ^a   Maldar, N N ^a   Deshmukh, L P ^a  

^a SOLAPUR UNIVERSITY   (India)

^b ELECTROTECHNICAL INSTITUTE   (Poland)

Author keywords

AFM; Chemical bath deposition; CoS; MFM; Optical studies; XRD

Indexed keywords

ALKALINITY; AMMONIA; CHEMICAL ANALYSIS; COBALT; DEPOSITION; GROWTH KINETICS; MAGNETIC FORCE MICROSCOPY; MAGNETISM; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SULFUR COMPOUNDS; THIN FILMS; TOPOGRAPHY; X RAY POWDER DIFFRACTION;

ABSORPTION CO-EFFICIENT; ATOMIC FORCE MICROGRAPHS; CHEMICAL-BATH DEPOSITION; EXPERIMENTAL CONDITIONS; MAGNETIC FORCE MICROSCOPIES (MFM); MICROSTRUCTURAL ANALYSIS; OPTICAL STUDY; OPTIMIZED CONDITIONS;

COBALT COMPOUNDS;

EID: 84919343659     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2014.10.183     Document Type: Article

References (18)

1. S.T. Mane, S.S. Kamble, and L.P. Deshmukh Mater. Lett. 65 2011 2639 2641
2. S.A. Lendave, P.C. Pingale, and L.P. Deshmukh Rare Metal Mater. Eng. 41 2012 43 46
3. F.C. Eze, and C.E. Okeke Mater. Chem. Phys. 47 1997 31 36
4. F. Tao, Y.Q. Zhao, G.Q. Zhang, and H.L. Li Electrochem. Commun. 9 2007 1282
5. W.H. Shi, J.X. Zhu, X.H. Rui, X.H. Cao, C. Chen, H. Zhang, H.H. Hng, and Q.Y. Yan ACS Appl. Mater. Interfaces 4 2012 2999
6. S.J. Bao, Y. Li, C.M. Li, Q. Bao, Q. Lu, and J. Guo J. Cryst. Growth 8 2008 3745
7. A. Wold, and K. Dwight Solid State Chemistry 1993 Chapman and Hall New York
8. C.N.R. Rao, and K.P.R. Pisharody Prog. Solid State Chem. 10 1976 207
9. G. Hodes Chemical Solution Deposition of Semiconductor Films 2004 Marcel Dekker Inc. New York
10. K.L. Chopra Thin Film Technology and Applications K.L. Chopra, L.K. Malhotra, vol. 1 1984 T.M.H. Publishing Co. New Delhi, India
11. D.B. Mitzi Solution Processing of Inorganic Materials 2009 John Wiley and Sons Inc. New Jersey
12. J.A. Venables Introduction to Surface and Thin Film Processes 2003 Cambridge University Press
13. G. Hodes Phys. Chem. Chem. Phys. 9 2007 2181
14. J.A. Dean Lange's Handbook of Chemistry 13th ed. 1985 McGraw-Hill New York pp. 7-517
15. S.B. Patil, and A.K. Singh Appl. Surf. Sci. 256 2010 2884 2889
16. A. Wei, J. Liu, M. Zhuang, and Y. Zhao Mater. Sci. Semicond. Process. 16 2013 1478 1484
17. Z. Liang, K. Sasikumar, and P. Keblinski Phys. Rev. Lett. 113 2014 065901
18. N.F. Mott, and E.A. Davis Electronic Processes in Non-crystalline Materials 1971 Mott and Davis Clarendon Press Oxford