High-yield graphene exfoliation using sodium dodecyl sulfate accompanied by alcohols as surface-tension-reducing agents in aqueous solution

Carbon

Volumn 83, Issue , 2015, Pages 136-143

  Yeon, Changbong ^a,b   Yun, Sun Jin ^a,b   Lee, Kyu Sung ^a   Lim, Jung Wook ^a,b  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b University of Science and Technology (UST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL MICELLE CONCENTRATION; EXFOLIATION (MATERIALS SCIENCE); GRAPHENE; GRAPHITE; MICELLES; REDUCING AGENTS; SULFUR COMPOUNDS; SURFACE TENSION;

CRITICAL MICELLE CONCENTRATION (CMC); HIGH YIELD; SURFACE AGGREGATION;

SODIUM DODECYL SULFATE;

EID: 84916894713     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2014.11.035     Document Type: Article

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