Estimation of the real temperature of samples in IR cell using OH frequency of silica

Surface and Interface Analysis

Volumn 47, Issue 1, 2015, Pages 166-168

  Yamazaki, H ^a   Shima, H ^b   Yoda, E ^c   Kondo, J N ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b MITSUBISHI CHEMICAL CORPORATION   (Japan)

^c IBARAKI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Calibration; IR; OH band; Temperature

Indexed keywords

CALIBRATION; CELLS; CYTOLOGY; IRIDIUM; SILICA; STRETCHING; TEMPERATURE;

AMORPHOUS SILICA; OH BAND; REAL-TEMPERATURE; STRETCHING VIBRATIONS;

FREQUENCY ESTIMATION;

EID: 84916221356     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5654     Document Type: Article

References (5)

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4. B. Lee, J. N. Kondo, K. Domen, F. Wakabayashi, Bull. Chem. Soc. Jpn. 1998; 71, 2149.
5. The concentration of SiOH groups under the present pretreatment conditions was estimated as 0.346mol g-1 (1.04 sites nm-2) by pyridine adsorption at 25 °C.