Mechanism of synergetic material removal by electrochemomechanical magnetorheological polishing

International Journal of Machine Tools and Manufacture

Volumn 70, Issue , 2013, Pages 88-92

  Jang, Kyung In ^a   Nam, Eunseok ^a   Lee, Chan Young ^a   Seok, Jongwon ^b   Min, Byung Kwon ^a  

^a Yonsei University   (South Korea)

^b Chung Ang University   (South Korea)

Author keywords

Electrochemomechanical polishing; Glassy carbon; Tribocorrosion

Indexed keywords

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROCHEMICAL OXIDATION; FILM GROWTH; GLASSY CARBON; OXIDE FILMS;

ELECTROCHEMOMECHANICAL; LOWER HARDNESS; MAGNETORHEOLOGICAL POLISHING; MATERIAL REMOVAL; MATERIAL REMOVAL MECHANISMS; NANOINDENTATION TESTS; POTENTIOSTATICS; TRIBO-CORROSION;

POLISHING;

EID: 84914698194     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2013.03.011     Document Type: Article

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