Transparent metallic fractal electrodes for semiconductor devices

Nano Letters

Volumn 14, Issue 9, 2014, Pages 5068-5074

  Afshinmanesh, Farzaneh ^a   Curto, Alberto G ^a,b   Milaninia, Kaveh M ^a   Van Hulst, Niek F ^b,c   Brongersma, Mark L ^a  

^a STANFORD UNIVERSITY   (United States)

^b ICFO INSTITUT DE CIENCIES FOTONIQUES   (Spain)

^c INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

Author keywords

metallic gratings; Nanostructured transparent electrodes; Si optoelectronics; space filling fractals

Indexed keywords

DIFFRACTION GRATINGS; ELECTRODES; FRACTALS; METALLIC COMPOUNDS; OPTICAL WAVEGUIDES; OPTOELECTRONIC DEVICES; OXIDE FILMS; POLARIZATION; SILICON; SILICON NITRIDE;

BROADBAND TRANSMISSION; METALLIC GRATINGS; NANO-STRUCTURED ELECTRODES; NANOSTRUCTURED METALLIC FILMS; PHOTOCURRENT MEASUREMENT; POLARIZATION-INDEPENDENT; SPACE-FILLING; TRANSPARENT ELECTRODE;

SEMICONDUCTOR DEVICES;

EID: 84914145350     PISSN: 15306984     EISSN: 15306992     Source Type: Journal    
DOI: 10.1021/nl501738b     Document Type: Article

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