Reaction of hydrofluoric acid and water with the GaAs (100) surface

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 3, 1990, Pages 1955-1960

  Graf D ^a   Grundner, M ^a   Ludecke D ^a   Schulz, R ^a  

^a WACKER CHEMIE AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84912912488     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576788     Document Type: Article

References (25)

1. C. C. Chang, P. H. Citrin, and B. Schwartz, J. Vac. Sci. Technol. 14, 943 (1977).
2. E. Huber and H. L. Hartnagel, Solid State Electron. 27, 589 (1984).
3. J. Massies and J. P. Contour, J. Appl. Phys. 58, 806 (1985).
4. Z. H. Lu, C. Lagarde, E. Sacher, J. F. Currie, and A. Yelon, J. Vac. Sci. Technol. A 7, 646 (1989).
5. K. W. Frese, Jr. and S. Roy Morrison, Surf. Sci. 8, 266 (1981).
6. P. A. Bertrand, J. Electrochem. Soc. 132, 973 (1985).
7. J. L. Zilko and R. S. Williams, J. Electrochem. Soc. 129, 406 (1982).
8. M. Ohno, Y. Ishii, and S. Miyazawa, J. Electrochem. Soc. 131, 2441 (1984).
9. T. T. Chiang and W. E. Spicer, J. Vac. Sci. Technol. A 7, 724 (1989).
10. S. D. Offsey, J. M. Woodall, A. C. Warren, P. D. Kirchner, T. I. Chappell, and G. D. Pettit, Appl. Phys. Lett. 48, 475 (1986).
11. N. A. Ives, G. W. Stupian, and M. S. Leung, Appl. Phys. Lett. 50, 256 (1987).
12. C. W. Wilmsen, P. D. Kirchner, J. M. Baker, D. T. McInturff, G. D. Pettit, and J. M. Woodall, J. Vac. Sci. Technol. B 6, 1180 (1988).
13. M. Grundner and R. Schulz, AIP Conf. Proc. 167, 329 (1988).
14. D. Graf, M. Grundner, and R. Schulz, J. Vac. Sci. Technol. A 7, 808 (1989).
15. D. Briggs and M. P. Seah, Practical Surface Analysis (Wiley, New York, 1983).
16. J. H. Scofield, J. Electron. Spectrosc. Relat. Phenom. 8, 129 (1976).
17. W. E. Spicer, I. Lindau, P. Pianetta, P. W. Chye, and C. M. Garner, Thin Solid Films 56, 1 (1979).
18. R. W. Bernstein and J. K. Grepstad, Surf. Interface Anal. 14, 109 (1989).
19. G. E. McGuire, G. K. Schweizer, and T. A. Carlson, Inorg. Chem. 12, 2451 (1973).
20. D. Gräf, M. Grundner, R. Schulz, and L. Mühlhoff, ECASIA Abstracts, 1989 p. 16.
21. D. J. Frankel, J. Anderson, G. H. Lapeyre, and H. H. Farrell, J. Vac. Sci. Technol. B 3, 1093 (1985).
22. D. J. Frankel, C. Yu, J. P. Harbison, and H. H. Farrell, J. Vac. Sci. Technol. B 5, 1113 (1987).
23. J. Massies and J. P. Contour, Appl. Phys. Lett. 46, 1150 (1985).
24. V. M. Bermudez, J. Appl. Phys. 54, 6795 (1983).
25. B. Schwartz, CRC Crit. Rev. Solid State Sci. 5, 609 (1975).