A facile and ultrasensitive photoelectrochemical sensor for copper ions using in-situ electrodeposition of cuprous oxide

Sensors and Actuators, B: Chemical

Volumn 208, Issue , 2015, Pages 485-490

  Qiu, Yanxia ^a,b   Li, Jing ^b   Li, Hongbo ^b   Zhao, Qi ^b   Wang, Hongmei ^b   Fang, Hailin ^b   Fan, Dahe ^b   Wang, Wei ^a,b  

^a CHANGZHOU UNIVERSITY   (China)

^b YANCHENG INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Copper ions; Cuprous oxide; Electrodeposition; Photoelectrochemistry; Sensor

Indexed keywords

ELECTROCHEMISTRY; ELECTRODEPOSITION; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; METAL IONS; SCANNING ELECTRON MICROSCOPY; SENSORS; SIGNAL TO NOISE RATIO; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

COPPER IONS; CUPROUS OXIDE; FACILE PREPARATION; LIMIT OF DETECTION; MASS SPECTROSCOPY; PHOTO-ELECTROCHEMISTRY; PHOTOELECTROCHEMICAL SENSORS; PHOTOELECTROCHEMICALS;

COPPER;

EID: 84912073109     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2014.11.061     Document Type: Article

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