Low-energy neutral/ion backscattering at As/Si(001)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 6, Issue 3, 1988, Pages 625-629

  Niehus, H ^a   Mann, K ^b   Eldridqe, B N ^c   Yu, M L ^c  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b Akan International ^*  (Germany)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84910782120     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.575180     Document Type: Article

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