α-Fe2O3 films for photoelectrochemical water oxidation - Insights of key performance parameters

Journal of Materials Chemistry A

Volumn 2, Issue 47, 2014, Pages 20196-20202

  Jia, Lichao ^a   Harbauer, Karsten ^a   Bogdanoff, Peter ^a   Herrmann Geppert, Iris ^b,c   Ramírez, Alejandra ^a   Van De Krol, Roel ^a   Fiechter, Sebastian ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b HELMUT SCHMIDT UNIVERSITY   (Germany)

^c INSTITUTE OF MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTROCHEMISTRY; HEMATITE; NANOCOMPOSITES; OXIDATION; PHOTOELECTROCHEMICAL CELLS; TIN OXIDES;

DEPOSITION PRESSURES; FLUORINE DOPED TIN OXIDE (FTO); KEY PERFORMANCE PARAMETERS; PHOTOCURRENT DENSITY; PHOTOELECTROCHEMICAL WATER OXIDATION; PHOTOELECTROCHEMICALS; RADIO-FREQUENCY SPUTTERING; TUNGSTEN HALOGEN LAMP;

OXIDE FILMS;

EID: 84910152398     PISSN: 20507488     EISSN: 20507496     Source Type: Journal    
DOI: 10.1039/c4ta04720f     Document Type: Article

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