Molecular layer deposition of alucone films using trimethylaluminum and hydroquinone

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 33, Issue 1, 2015, Pages

  Choudhury, Devika ^a   Sarkar, Shaibal K ^a   Mahuli, Neha ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR LAYER DEPOSITION; TRIMETHYLALUMINUM;

EID: 84908565084     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4900934     Document Type: Article

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