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Volumn , Issue , 2014, Pages 523-527
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Lithography challenges for 2.5D interposer manufacturing
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Author keywords
2.5D; 3D; Advanced Packaging; backside alignment; Glass Interposer; IR alignment; MCM; Multichip Module; overlay; Panel; RDL; Redistribution Layer; Si Interposer; sidewall angle; Stepper; thick resist; Through Glass Via; Through Silicon Via; TSG; TSV
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Indexed keywords
ALIGNMENT;
CHIP SCALE PACKAGES;
COST BENEFIT ANALYSIS;
COST REDUCTION;
GLASS;
GLASS INDUSTRY;
INTEGRATED CIRCUIT INTERCONNECTS;
LITHOGRAPHY;
MICROPROCESSOR CHIPS;
MULTICARRIER MODULATION;
MULTICHIP MODULES;
PROGRAMMABLE LOGIC CONTROLLERS;
SILICON WAFERS;
SUBSTRATES;
SYSTEM-ON-CHIP;
2.5D;
ADVANCED PACKAGING;
BACK-SIDE ALIGNMENTS;
IR ALIGNMENT;
OVERLAY;
PANEL;
REDISTRIBUTION LAYERS;
SI INTERPOSERS;
SIDEWALL ANGLES;
STEPPER;
THICK RESIST;
THROUGH GLASS VIA;
THROUGH-SILICON-VIA;
THREE DIMENSIONAL INTEGRATED CIRCUITS;
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EID: 84907897437
PISSN: 05695503
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ECTC.2014.6897334 Document Type: Conference Paper |
Times cited : (5)
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References (8)
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