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Volumn , Issue , 2014, Pages 523-527

Lithography challenges for 2.5D interposer manufacturing

Author keywords

2.5D; 3D; Advanced Packaging; backside alignment; Glass Interposer; IR alignment; MCM; Multichip Module; overlay; Panel; RDL; Redistribution Layer; Si Interposer; sidewall angle; Stepper; thick resist; Through Glass Via; Through Silicon Via; TSG; TSV

Indexed keywords

ALIGNMENT; CHIP SCALE PACKAGES; COST BENEFIT ANALYSIS; COST REDUCTION; GLASS; GLASS INDUSTRY; INTEGRATED CIRCUIT INTERCONNECTS; LITHOGRAPHY; MICROPROCESSOR CHIPS; MULTICARRIER MODULATION; MULTICHIP MODULES; PROGRAMMABLE LOGIC CONTROLLERS; SILICON WAFERS; SUBSTRATES; SYSTEM-ON-CHIP;

EID: 84907897437     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2014.6897334     Document Type: Conference Paper
Times cited : (5)

References (8)
  • 1
  • 2
    • 84907903879 scopus 로고    scopus 로고
    • Corning, RTI, Rudolph: Advancements in Fabrication of Glass Interposers, Orlando, FL
    • Aric Shorey, Alan Huffman, John Keech, Matt Lueck, Scott Pollard, Philippe Cochet, Klaus Ruhmer (Corning, RTI, Rudolph): Advancements in Fabrication of Glass Interposers, ECTC 2014, Orlando, FL.
    • (2014) ECTC
    • Shorey, A.1    Huffman, A.2    Keech, J.3    Lueck, M.4    Pollard, S.5    Cochet, P.6    Ruhmer, K.7
  • 4
    • 84907886458 scopus 로고    scopus 로고
    • Architectural Success of 2.1D & 2.5D, SEMI 3D Summit, Grenoble, France, January
    • Ron Huemoeller, AMKOR Technology, Architectural Success of 2.1D & 2.5D, SEMI 3D Summit, Grenoble, France, January 2014
    • (2014) AMKOR Technology
    • Huemoeller, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.