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Volumn , Issue , 2002, Pages 471-474

Electrical characterisation of silicon-rich-oxide based memory cells using pulsed current-voltage techniques

Author keywords

[No Author keywords available]

Indexed keywords

MOS CAPACITORS; SILICON;

EID: 84907709957     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2002.194970     Document Type: Conference Paper
Times cited : (16)

References (9)
  • 2
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    • Analytical model for failure rate prediction due to anomalous charge loss of flash memories
    • R. Degraeve et al., Analytical model for failure rate prediction due to anomalous charge loss of flash memories, IEDM 2001, pp. 699-702.
    • (2001) IEDM , pp. 699-702
    • Degraeve, R.1
  • 3
    • 0034224349 scopus 로고    scopus 로고
    • On the go with SONOS
    • July
    • M. H. White et al., On the go with SONOS, Circuits & Devices, July 2000, pp. 22-31.
    • (2000) Circuits & Devices , pp. 22-31
    • White, M.H.1
  • 4
    • 84907569058 scopus 로고    scopus 로고
    • 3 film as storage node
    • A. Fernandes et al., Electrical Characterisation of Memory-Cell Structures Employing Ultra-Thin Al2O3 Film as storage Node, ESSDERC 2001, pp. 139-42.
    • (2001) ESSDERC , pp. 139-142
    • Fernandes, A.1
  • 5
    • 0034453547 scopus 로고    scopus 로고
    • A novel aerosol-nanocrystal floating-gate device for non-volatile memory applications
    • J. De Blauwe et al., A novel, aerosol-nanocrystal floating-gate device for non-volatile memory applications, IEDM 2000, pp. 683-86.
    • (2000) IEDM , pp. 683-686
    • De Blauwe, J.1
  • 6
    • 84907487263 scopus 로고    scopus 로고
    • Quasi-non volatile flatband-voltage shift in metal-oxide-semiconductor capacitors with silicon-rich-oxide dielectric
    • M. Rosmeulen et al., Quasi-Non Volatile Flatband-Voltage Shift in Metal-Oxide-Semiconductor Capacitors with Silicon-Rich-Oxide Dielectric, ESSDERC 2001, pp. 183-86.
    • (2001) ESSDERC , pp. 183-186
    • Rosmeulen, M.1
  • 7
  • 9
    • 0022667218 scopus 로고
    • 2-induced substrate current and its relation to positive charge in field-effect transistors
    • Z. A. Weinberg et al., SiO2-induced substrate current and its relation to positive charge in field-effect transistors, J. Appl. Phys. 59 (3), 1986, pp. 824-32.
    • (1986) J. Appl. Phys. , vol.59 , Issue.3 , pp. 824-832
    • Weinberg, Z.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.