Homogenous hot hole injection by tunnelling in gate oxides of CMOS devices

European Solid-State Device Research Conference

Volumn , Issue , 1994, Pages 515-518

  Brozek, Tomasz ^a   Viswanathan, Chand R ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS DEVICES; GATE OXIDE; HOT HOLE INJECTIONS;

EID: 84907695075     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)