Multiple gate oxide technology using fluorine implantation

European Solid-State Device Research Conference

Volumn , Issue , 2001, Pages 107-110

  Woerlee, P H ^a   Knitel, M J ^a   Meyssen, V M H ^a   Velghe, R M D A ^a   Van Duijnhoven, A T A Zegers ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE IMPLANTATION; MULTIPLE GATE OXIDES;

EID: 84907501500     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2001.195212     Document Type: Conference Paper

References (4)

1. C. T. Liu et al., VLSI Symp. Tech. Digest., pp18 (1996).
2. M. Hargrove et al., IEDM Tech. Digest, pp 589 (1998).
3. Y. Goto et al., Symp. on VLSI Tech., pp 148 (2000).
4. M. J. Knitel et al., IEDM Tech. Digest., pp 463 (2000).