Highly uniform and low-loss passive silicon photonics devices using a 300mm CMOS platform

Conference on Optical Fiber Communication, Technical Digest Series

Volumn , Issue , 2014, Pages

  Selvaraja, Shankar Kumar ^a   De Heyn, Peter ^b   Winroth, Gustaf ^a   Ong, Patrick ^a   Lepage, Guy ^a   Cailler, Celine ^c   Rigny, Arnaud ^c   Bourdelle, Konstantin K ^c   Bogaerts, Wim ^b   Van Thourhout, Dries ^b   Van Campenhout, Joris ^a   Absil, Philippe ^a  

^a IMEC   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

^c PARC TECHNOLOGIQUE DES FONTAINES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL VARIATIONS; LOW-LOSS; PROPAGATION LOSS; SILICON PHOTONICS; SLOT WAVEGUIDE;

PHOTONICS;

EID: 84907385522     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/OFC.2014.6886713     Document Type: Conference Paper

References (4)

1. Krishnamoorthy, A. V., Pinguet, T., Mekis, A., Thacker, H., Shubin, I., Raj, K., and Cunningham, J. E, "Exploiting CMOS Manufacturing to Reduce Tuning Requirements for Resonant Optical Devices", IEEE Photo. J., 3(3), 567-579 (2011).
2. Shankar Selvaraja, Gayle Murdoch, Alexey Milenin, Christie Delvaux, Patrick Ong, Shibnath Pathak, Diedrik Vermeulen, Gunther Sterckx, Gustaf Winroth, Peter Verheyen, Guy Lepage, Wim Bogaerts, Roel Baets, Joris Van Campenhout, Philippe Absil, "Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors", OECC2012 PD 15-16 (2012).
3. Hody, H., Vecchio, E., Boullart, W., & Boullart, W., "Double patterning with dual hard mask for 28-nm node devices and below.", J. Micro/Nanolith. MEMS MOEMS 12(4), 041306 (2013).
4. Peter De Heyn, Jeroen De Coster, Peter Verheyen, Guy Lepage, Marianna Pantouvaki, Philippe Absil, Wim Bogaerts, Joris Van Campenhout, and Dries Van Thourhout, "Fabrication-Tolerant Four-Channel Wavelength-Division- Multiplexing Filter Based on Collectively Tuned Si Microrings" J. Lightw. Technol. 31(16), 2785-2792 (2013).