Ultrathin Ti-doped hematite photoanode by pyrolysis of ferrocene

International Journal of Hydrogen Energy

Volumn 39, Issue 27, 2014, Pages 14596-14603

  Li, Shipu ^a   Zhang, Peng ^a   Song, Xuefeng ^a   Gao, Lian ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Photoelectrochemistry; Pyrolysis; Thin film

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FILM THICKNESS; HEMATITE; ORGANOMETALLICS; PYROLYSIS; THIN FILMS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; FERROCENES; HEMATITE PHOTOANODE; METAL SUBSTRATE; PHOTO-ANODES; PHOTO-ELECTROCHEMISTRY; SURFACE FEATURE; TI SUBSTRATES;

FILM PREPARATION;

EID: 84906781912     PISSN: 03603199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijhydene.2014.07.110     Document Type: Article

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