Synergistic effect of H2O and O2 on the decoupling of epitaxial monolayer graphene from SiC(0 0 0 1) via thermal treatments

Carbon

Volumn 78, Issue , 2014, Pages 298-304

  Bom, N M ^a,b   Oliveira, M H ^a,c   Soares, G V ^b   Radtke, C ^b   Lopes, J M J ^a   Riechert, H ^a  

^a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^c FEDERAL UNIVERSITY OF MINAS GERAIS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; GRAPHENE; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING ATMOSPHERES; BILAYER GRAPHENE; OXIDE LAYER; SIC(0 0 0 1); SYNERGISTIC EFFECT;

BUFFER LAYERS;

EID: 84906310396     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2014.07.006     Document Type: Article

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