Hydrogen-assisted pulsed KrF-laser irradiation for the in situ photoreduction of graphene oxide films

Carbon

Volumn 77, Issue , 2014, Pages 857-867

  Le Borgne, Vincent ^a   Bazi, Hamza ^a   Hayashi, Takuya ^b   Kim, Yoong Ahm ^b,c   Endo, Morinobu ^b   El Khakani, My Ali ^a  

^a INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE   (Canada)

^b SHINSHU UNIVERSITY   (Japan)

^c Chonnam National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; GRAPHENE; OXIDE FILMS; SHEET RESISTANCE;

BUILDING BLOCKES; ELECTRICAL RESISTANCES; GRAPHENE OXIDE FILMS; GRAPHENE OXIDES; HYDROGEN PRESSURES; REDUCTION PROCESS; ROOM TEMPERATURE; SILICON SUBSTRATES;

ATOM LASERS;

EID: 84905658534     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2014.05.090     Document Type: Article

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