Sputter deposition of stress-controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 61, Issue 8, 2014, Pages 1329-1334

  Barth, Stephan ^a,b   Bartzsch, Hagen ^a   Gloess, Daniel ^a   Frach, Peter ^a   Herzog, Thomas ^c   Walter, Susan ^c   Heuer, Henning ^c  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c FRAUNHOFER INSTITUTE FOR CERAMIC TECHNOLOGIES AND SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DEPOSITION; FILM THICKNESS; GRAIN SIZE AND SHAPE; PIEZOELECTRICITY;

CHARACTERIZATION METHODS; FILM STRESS; GRADIENT LAYERS; MEAN-GRAIN SIZE; MECHANICAL STRESS; PIEZOELECTRIC PROPERTY; PULSE ECHOES; SPUTTER PRESSURE;

STRESSES;

EID: 84905267668     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/TUFFC.2014.3040     Document Type: Article

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